EUV With Fewer Mirrors?

Has it really been so long since I last did a newsletter? That is kind of crazy. Time moves so fast.Like as I wrote before, I want to thank Professor Shintake as well as Dr. Patrick Naulleau of EUV Tech for their help and consultation. They are the true experts of this domain. I do want to note that ASML chose the number of mirrors they did for a very real reason. It gives them full ability to print specific features on the mask. Simplifying the number of mirrors that away so we should keep this...